SUSS MA6 Mask Aligner
Supplied, sold and supported by Petrano Supply Inc. in Canada.
Proven mask alignment and exposure system for research cleanrooms.
Overview
The SUSS MA6 mask aligner is a proven lithography workhorse for research cleanrooms, supporting contact and proximity exposure on substrates up to 150 mm. Petrano sources and configures systems to requirement, with delivery, installation and commissioning coordinated for Canadian research facilities.
Applications
- University cleanrooms
- MEMS and photonics research
Key specifications
| Function | Mask alignment and exposure (contact / proximity) |
|---|---|
| Substrates | Up to 150 mm |
| Supply model | Sourced and configured to requirement |
| Full specifications | Confirmed at quotation |
Specifications are provided by the manufacturer, are for general information only, may change without notice, and are confirmed at quotation.
Third-party brands are used for identification only unless an authorized relationship is expressly stated.
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